Tantalum Target

Next > >

Tantalum Target

<< Previous

Send Inquiry

Product Code : 67

Price And Quantity

Minimum Order Quantity
1 Piece
Price
1 USD ($)

Product Specifications

Product Type
Tantalum Target
Material
tantalum

Product Description

Better known as tantalum planar sputtering target, the offered Tantalum Target ensures trouble free reproducible process performance and maintains uniformity regarding thickness. With application of this tantalum item, there is no need of utilizing texture banding for attaining even microstructure of sputter. Moreover, this tantalum item helps to extend functional life and improves performance of sputter. We provide this item with 3N to 5N purity level with even grain size. The metallic and gaseous impurities of offered item have been verified by using advanced technology. We are a well known manufacturer of standard grade Tantalum Target.

Features:

High biocompatibility
High strength under extreme temperature
Helps to enhance performance of sputter

Application
The offered tantalum item is utilized for producing thin film based items like gate electrode used in MOSFET device, diffusion barrier material, barrier metal for copper wiring system, memory device and as protective coating on print head system.

Chemical Composition :

Chemistry ppm
Description	Chief component		Impurities maximum
Description	Ta	Nb	Fe	Si	Ni	W	Mo	Ti	O	C	H	N
Ta1	Remainder	300	40	30	20	40	40	20	150	40	15	20
Ta2	Remainder	800	100	100	50	200	200	50	200	100	15	100
TaNb3	Remainder	＜35000	100	100	50	200	200	50	200	100	15	100
TaNb20	Remainder	170000- 230000	100	100	50	200	200	50	200	100	15	100
Ta2.5W	Remainder	400	50	30	20	30000	60	20	150	50	15	60
Ta10W	Remainder	400	50	30	20	110000	60	20	150	50	15	60