
Better known as tantalum planar sputtering target, the offered Tantalum Target ensures trouble free reproducible process performance and maintains uniformity regarding thickness. With application of this tantalum item, there is no need of utilizing texture banding for attaining even microstructure of sputter. Moreover, this tantalum item helps to extend functional life and improves performance of sputter. We provide this item with 3N to 5N purity level with even grain size. The metallic and gaseous impurities of offered item have been verified by using advanced technology. We are a well known manufacturer of standard grade Tantalum Target.
Features:
Chemical Composition :
Chemistry ppm | ||||||||||||
Description | Chief component | Impurities maximum | ||||||||||
Ta | Nb | Fe | Si | Ni | W | Mo | Ti | O | C | H | N | |
Ta1 | Remainder | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
Ta2 | Remainder | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
TaNb3 | Remainder | <35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
TaNb20 | Remainder | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
Ta2.5W | Remainder | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
Ta10W | Remainder | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
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ZHUZHOU JIABANG REFRACTORY METAL CO., LTD.
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